Your FIB-SEM for High Throughput 3D Analysis and Sample Preparation
ZEISS Crossbeam is a focused ion beam scanning electron microscope (FIB-SEM) that combines the proven and highly flexible GEMINI field emission technology with an all new, state of the art gallium ion beam column. The GEMINI design provides superb low voltage imaging and stability with excellent resolution and does not expose the specimen to a magnetic field, thus enabling distortion-free, high-resolution imaging over large field of view as well as tilting without influencing the electron optical performance. The Capella gallium ion beam column delivers up to 100nA of probe current with excellent beam current stability. Simultaneous high-resolution SEM imaging and FIB milling make ZEISS Crossbeam the ideal instrument for 3D nanotomography, nanofabrication, and analytical applications.
ZEISS Xradia 520 Versa
Your X-ray Microscope for Submicron X-ray Imaging
Unlock new degrees of versatility for your scientific discovery and industrial research with the ZEISS Xradia 520 Versa 3D X-ray microscope; the most advanced model in the Xradia Versa family. Building on industry-best resolution and contrast, Xradia 520 Versa
expands the boundaries of non-destructive imaging for breakthrough flexibility and discernment critical to your research. Innovative contrast and acquisition techniques free you to seek – and find – what you have never seen before. Move beyond exploration and achieve discovery.
Innovative contrast and acquisition techniques free you to seek – and find – what you have never seen before. Move beyond exploration and achieve discovery.
ZEISS ORION Nanofab
Sub-nanometer imaging of insulating specimens and nanofabrication applications
ZEISS ORION NanoFab is a unique focused ion beam instrument capable of generating helium, neon, and gallium ion beams. Based on the Gas Field Ion Source (GFIS) technology, the instrument creates an extremely collimated, highly coherent ion beam that can be used for highest
resolution imaging with probe sizes of less than 0.5nm and for precise nanofabrication down to a dimension of about 5nm. This allows for the fabrication of structures such as plasmonic devices and nanopores,
patterning of 2D materials, or ion beam lithography with feature sizes well below of what can be achieved with conventional gallium FIBs. The use of inert ion species also eliminates metallic
contamination during the milling process and enables deposition of ultra-fine high quality metal or insulator lines. The addition of a gallium focused ion beam column allows for large volume material removal at high speeds.
ZEISS Smartproof 5
Your Integrated Confocal Microscope for Surface Imaging
The versatile ZEISS Smartproof 5 widefield confocal microscope is your integrated non-contact system for surface analysis: fast, precise and repeatable. Put it to work on a wide range of industrial applications - such as surface roughness and topographic measurement with
nanometer resolution that comes up daily in QA/QC, failure analysis and R&D labs.
ZEISS Smartzoom 5
Imaging Made Simple: Your Automated Digital
Microscope for QC and Failure Analyses
Smartzoom 5 is your smart digital microscope - ideal for QC/QA and Failure Analysis applications in virtually every field of industry. Fully automated and equipped with dedicated workflows, it’s so simple to operate, even untrained users will produce excellent results. With integrated overview camera for Google Earth like navigation makes the area of interest fast and easy to locate. A wide magnification range of 10x-2000x with 10x Zoom covers a variety of applications for 2D and 3D imaging and measurement.